Etched Glass Surfaces, Atomic Force Microscopy and Stochastic Analysis

Abstract

The effect of etching time scale of glass surface on its statistical properties has been studied using atomic force microscopy technique. We have characterized the complexity of the height fluctuation of a etched surface by the stochastic parameters such as intermittency exponents, roughness, roughness exponents, drift and diffusion coefficients and find their variations in terms of the etching time.