Exploiting and engineering the optical field-enhancement in metal nanoparticle based circuits

Abstract

We study the impact of optical field-enhancement effects on the optoelectronic properties of metal nanoparticle arrays. Applying a focused ion beam lithography in combination with an electron beam deposition technique we can pattern electrical contacts in a way to give rise to an electromagnetic field-enhancement. A further field-enhancement is achieved by the plasmon resonance of the particles. Both effects are directly observed in the photoconductance of the arrays.