Evidence for semiconducting behavior with a narrow band gap of Bernal graphite

Abstract

We have studied the resistivity of a large number of highly oriented graphite samples with areas ranging from several mm2 to a few μm2 and thickness from 10 nm to several tens of micrometers. The measured resistance can be explained by the parallel contribution of semiconducting graphene layers with low carrier density < 109 cm-2 and the one from metallic-like internal interfaces. The results indicate that ideal graphite with Bernal stacking structure is a narrow-gap semiconductor with an energy gap Eg 40 meV.

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