A study of thermally-induced optical bistability and the role of surface treatments in Si-based mid-infrared photonic crystal cavities
Abstract
We report the observation of optical bistability in Si-based photonic crystal cavities operating around 4.5 μm. Time domain measurements indicate that the source of this optical bistability is thermal, with a time constant on the order of 5 μs. Quality (Q) factor improvement is shown by the use of surface treatments (wet processes and annealing), resulting in an increase of Q-factor from 11,500 to 29,300 at 4.48 μm. After annealing in a N2 environment, optical bistability is no longer seen in our cavities.
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