Colossal electroresistance in metal/ferroelectric/semiconductor tunnel diodes for resistive switching memories
Abstract
We propose a tunneling heterostructure by replacing one of the metal electrodes in a metal/ferroelectric/metal ferroelectric tunnel junction with a heavily doped semiconductor. In this metal/ferroelectric/semiconductor tunnel diode, both the height and the width of the tunneling barrier can be electrically modulated due to the ferroelectric field effect, leading to a colossal tunneling electroresistance. This idea is implemented in Pt/BaTiO3/Nb:SrTiO3 heterostructures, in which an ON/OFF conductance ratio above 104 can be readily achieved at room temperature. The colossal tunneling electroresistance, reliable switching reproducibility and long data retention observed in these ferroelectric tunnel diodes suggest their great potential in non-destructive readout nonvolatile memories.
Turn this paper into a lesson
ArcXiv compiles a structured reading guide from this paper's metadata: plain-English importance, contributions, prerequisite concepts, which sections to read first, flashcards, and a quiz. Grounded in the abstract, never invented.