Effect of annealing on the superconducting properties of a-Nb(x)Si(1-x) thin films
Abstract
a-Nb(x)Si(1-x) thin films with thicknesses down to 25 have been structurally characterized by TEM (Transmission Electron Microscopy) measurements. As-deposited or annealed films are shown to be continuous and homogeneous in composition and thickness, up to an annealing temperature of 500C. We have carried out low temperature transport measurements on these films close to the superconductor-to-insulator transition (SIT), and shown a qualitative difference between the effect of annealing or composition, and a reduction of the film thickness on the superconducting properties of a-NbSi. These results question the pertinence of the sheet resistance Rsquare as the relevant parameter to describe the SIT.
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