Statistical simulation of pattern formation on plane target surfaces by ion beam sputtering

Abstract

Numerical simulation of pattern formation on plane target surfaces undergoing ion-beam sputtering is carried out. Base of the mathematical model of target ion-sputtering is nonlinear evolutionary equation in which the erosion velocity dependence on ion flux is evaluated by means of a Monte Carlo method. This approach needs much computational resources, but allows to investigate the influence of ion flux parameters on surface topography. Deviation of the findings from the pattern formation predicted by the continuum model is discussed.