Main Magnetic Focus Ion Source: II. The first investigations at 10 keV

Abstract

The basic principles of design for the compact ion source of new generation are presented. The device uses the local ion trap created by the axial electron beam rippled in a thick magnetic lens. In accordance with this feature, the ion source is given the name main magnetic focus ion source. The experimental evidences for the production of Ir$^{59+}$, Xe$^{44+}$, and Ar$^{16+}$ ions are obtained. The control over depth of the local ion trap is shown to be feasible.