Electron back scattering in CNTFETs

Abstract

A new non-ballistic analytical model for the intrinsic channel region of MOSFET-like single-walled carbon-nanotube field-effect transistors with ohmic contacts has been developed which overcomes the limitations of existing models and extends their applicability toward high bias voltages needed for analog applications. The new model comprises an improved description of electron-phonon scattering mechanism taking into account the accumulation of electrons at the bottom of conduction subband due to back scattering by optical phonons. The model has been justified by a Boltzmann transport equation solver. The simulation results are found to be in agreement with experimental data for highly doped CNTFETs.