Impact of Edge States on Device Performance of Phosphorene Heterojunction Tunneling Field Effect Transistors

Abstract

Black phosphorus (BP) tunneling transistors (TFETs) using heterojunction (He) are investigated by atomistic quantum transport simulations. It is observed that edge states have a great impact on transport characteristics of BP He-TFETs, which result in the potential pinning effect and deteriorate the gate control. While, on-state current can be effectively enhanced by using hydrogen to saturate the edge dangling bonds in BP He-TFETs, in which edge states are quenched. By extending layered BP with a smaller band gap to the channel region and modulating the BP thickness, device performance of BP He-TFETs can be further optimized and fulfill the requirements of the international technology road-map for semiconductors (ITRS) 2013 for low power applications. In 15 nm 3L-1L and 4L-1L BP He-TFETs along armchair direction on-state current can reach above 10$^3$ $\mu$A/$\mu$m with the fixed off-state current of 10 $pA/\mu$m. It is also found that ambipolar effect can be effectively suppressed in BP He-TFETs.