Comment on pyramidal structure formation at the interface between III/V semiconductors and silicon

Abstract

GaP/Si(100) is considered as pseudomporphic virtual substrate for III/V-on-Si integration in order to reduce defects related to polar-on-nonpolar heteroepitaxy. The atomic structure of the GaP/Si(100) heterointerface is decisive to yield low defect densities and its dependence on nucleation conditions is still under debate. Recently, Beyer et al. suggested the formation of a 'pyramidal' structure as a general mechanism at polar-on-nonpolar interfaces [A. Beyer et al., Chem. Mat. 28, 3265 (2016)]. However, their DFT studies neglected the dependence of the calculated interfacial energies on appropriate chemical potentials and their findings are contradictory to recent and past experimental data.