Nondestructive method of thin film dielectric constant measurements by two-wire capacitor

Abstract

We suggest the nondestructive method for determination of the dielectric constant of substrate-deposited thin films by capacitance measurement with two parallel wires placed on top of the film. The exact analytical formula for the capacitance of such system is derived. The functional dependence of the capacitance on dielectric constants of the film, substrate, and environment media and on the distance between the wires permits to measure the dielectric constant of thin films for the vast set of parameters where previously proposed approximate methods are less efficient.