Compact Modeling of MOSFET I-V Characteristics and Simulation of Dose-Dependent Drain Currents

Abstract

We have presented a compact MOSFET model, which allows us to describe the I-V characteristics of irradiated long-channel and short-channel transistors in all operation modes at different measurement temperatures and interface trap densities. The model allows simulating of the off-state and the on-state drain currents of irradiated MOSFETs based on an equal footing. Particularly, a novel compact model of the rebound effect in n-MOSFETs was employed for simulation of the total dose dependencies of drain currents in the highly scaled 60 nm node circuits irradiated up to 1Grad. Compatibility of the model parameter set with BSIM and a single closed form of the model equation imply the possibility of its easy implementation into the standard CAD tools.