The chemical potential and the work function of a metal film on a dielectric substrate

Abstract

The chemical potential and the work function of an aluminum film, which (1) is in vacuum and (2) is located on a dielectric substrate is calculated within the model of non-interacting electrons located in an asymmetric rectangular potential well. For the first time in calculating these values for such a model of a metal film, the electroneutrality condition is correctly taken into account. This leads to the correct behavior of these values, namely: if the thickness of the film increases, these characteristics tend to their bulk values.