Hopping conductance and macroscopic quantum tunneling effect in three dimensional Pbx(SiO2)1-x nanogranular films

Abstract

We have studied the low-temperature electrical transport properties of Pbx(SiO2)1-x (x being the Pb volume fraction) nanogranular films with thicknesses of 1000 nm and x spanning the dielectric, transitional, and metallic regions. It is found that the percolation threshold xc lies between 0.57 and 0.60. For films with x0.50, the resistivities as functions of temperature T obey (/kBT) relation ( being the local superconducting gap and the kB Boltzmann constant) below the superconducting transition temperature Tc (7 K) of Pb granules. The value of the gap obtained via this expression is almost identical to that by single electron tunneling spectra measurement. The magnetoresistance is negative below Tc and its absolute value is far larger than that above Tc at a certain field. These observations indicate that single electron hopping (or tunneling), rather than Cooper pair hopping (or tunneling) governs the transport processes below Tc. The temperature dependence of resistivities shows reentrant behavior for the 0.50<x<0.57 films. It is found that single electron hopping (or tunneling) also dominates the low-temperature transport process for these films. The reduction of the single electron concentration leads to an enhancement of the resisivity at sufficiently low temperature. For the 0.600.72 films, the resistivities sharply decrease with decreasing temperature just below Tc, and then show dissipation effect with further decreasing temperature. Treating the conducting paths composed of Pb particles as nanowires, we have found that the R(T) data below Tc can be well explained by a model that includes both thermally activated phase slips and quantum phase slips.

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