Influence of Si doping and O2-flow on arc deposited (Al,Cr)2O3 coatings

Abstract

(Al,Cr)2O3 coatings with Al/(Al+Cr) = 0.5 or Al = 70 at.%, doped with 0, 5 or 10 at.% Si, were deposited on hard metal and Si(100) substrates to elucidate the influence of Si on the resulting coatings. The chemical analysis of the coatings showed between 3.3 and 7.4 at.% metal fraction Si incorporated into all studied coatings depending on cathode Si-composition. The incorporated Si content does not change significantly with different oxygen flow covering a wide range of deposition conditions from low to high O2 flow during growth. The addition of Si promotes the metastable B1-like cubic structure over the thermodynamically stable corundum structure. The hardness determined by nanoindentation of the as-deposited coatings is slightly reduced upon Si-incorporation as well as upon increased Al-content. Si is found enriched in droplets but can also be found at a lower content, evenly spread, without visible segregation on the ~5 nm scale, in the actual oxide coating. The positive effect of improved cathode erosion upon Si-incorporation has to be balanced against the promotion of the metastable B1-like structure, having lower room temperature hardness and inferior thermal stability compared to the corundum structure.