Electron Collision Cross Sections in Tetrafluoropropene HFO1234ze(E) for Gas Mixtures in Resistive Plate Chambers
Abstract
In recent years, there has been growing interest in tetrafluoropropene HFO1234ze(E) (C3H2F4) for Resistive Plate Chambers (RPCs). This novel gas is considered a promising alternative to the standard mixtures currently used in RPCs, thanks to its low global warming potential. The knowledge of electron collision cross sections in C3H2F4 enables reliable predictions of electron transport coefficients and reaction rates in C3H2F4-based gas mixtures. This allows for optimizing the C3H2F4-based gas mixtures to achieve the desired performance in RPCs. From measurements of electron transport coefficients and reaction rates, a complete set of scattering cross sections for electrons in C3H2F4 has been derived. Validation of the electron collision cross sections is achieved through systematic comparisons of electron swarm parameters with experimental data in both pure C3H2F4 and C3H2F4/CO2 gas mixtures. Given the influence of electron attachment in C3H2F4 by the gas density, this work also includes precise calculations of the critical electric field strength in such mixtures. This set of cross sections has been further utilized to compute the effective ionization Townsend coefficient in gas mixtures containing C3H2F4, potentially applicable for RPCs.