Fabrication of Ultra-High Q Silica Microdisk Using Chemo-Mechanical Polishing

Abstract

Here we demonstrate that adding a chemo-mechanical polishing (CMP) procedure to conventional photolithography, a silica microdisk with ultra-high quality factors ($>10^8$) can be fabricated. By comparing with the intrinsic optical quality factor (Q) measured at 970~nm, we observe that due to the significantly reduced surface roughness, at 1550~nm wavelength the water molecule absorption at the cavity surface supersedes Rayleigh scattering as the dominant factor for Q degradation.