Phase mask pinholes as spatial filters for laser interference lithography

Abstract

Laser resonators have outputs with Gaussian spatial beam profiles. In laser interference lithography (LIL), using such Gaussian shaped beams leads to an inhomogeneous exposure of the substrate. As a result, dimensions of lithography defined features vary significantly across the substrate. In most LIL setups, pinholes are used as filters to remove optical noise. Following a concept proposed by Hariharan et. al. a phase mask can be added to these pinholes. In theory, this modification results in a more uniform beam profile, and, if applied as spatial filters in LIL, in improved exposure and hence feature size uniformity. Here, we report on the first successful fabrication of such elements and demonstrate their use in an LIL setup to reduce feature dimension variations from 47.2% to 27.5% using standard and modified pinholes, respectively.