Impact of plasma potential and plasma sheath composition on the InN PAMOCVD growth kinetics and structural properties
Abstract
In this paper, we present the effect of various growth parameters of PA-MOCVD on the plasma potential. The impact of varying plasma potential on the growth and structural properties of the InN films, and how the growth process and film properties will be affected if an external DC bias perturbs the plasma potential.
0
Turn this paper into a lesson
ArcXiv compiles a structured reading guide from this paper's metadata: plain-English importance, contributions, prerequisite concepts, which sections to read first, flashcards, and a quiz. Grounded in the abstract, never invented.