Noise probing of topological band gaps in dispersionless quantum states

Abstract

We uncover a useful connection between the integrated current noise $S(\omega)$ and the topological band gap in dispersionless quantum states, $\int d \omega [ \mathcal S^{\text{flat}}_{xx} + \mathcal S^{\text{flat}}_{yy} ] = C e^2 \Delta^2$ (in units $\hbar$$=$$1$), where $C$ is the Chern number, $e$ is electric charge, and $\Delta$ is the topological band gap. This relationship may serve as a working principle for a new experimental probe of topological band gaps in flat band materials. Possible applications include moir\'e systems, such as twisted bilayer graphene and twisted transition metal dichalcogenides, where a band gap measurement in meV regime presents an experimental challenge.