Fabrication of low-loss III-V Bragg-reflection waveguides for parametric down-conversion
Abstract
Entangled photon pairs are an important resource for quantum cryptography schemes that go beyond point-to-point communication. Semiconductor Bragg-reflection waveguides are a promising photon-pair source due to mature fabrication, integrability, large transparency window in the telecom wavelength range, integration capabilities for electro-optical devices as well as a high second-order nonlinear coefficient. To increase performance we improved the fabrication of Bragg-reflection waveguides by employing fixed-beam-moving-stage optical lithography, low pressure and low chlorine concentration etching, and resist reflow. The reduction in sidewall roughness yields a low optical loss coefficient for telecom wavelength light of alphareflow = 0.08(6)mm(-1). Owing to the decreased losses, we achieved a photon pair production rate of 8800(300)(mW*s*mm)(-1) which is 15-fold higher than in previous samples.
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