Magnetic penetration depth of Aluminum thin films

Abstract

We present a study of the superconducting penetration depth λ in aluminum thin films of varying thickness. The range of thicknesses chosen spans from the thin-film regime to the regime approaching bulk behavior. The penetration depths observed range from λ = 163.30.4~nm for the thinnest 20~nm samples down to λ = 53.60.4~nm for the 200~nm-thick ones. In order to accurately determine λ, we performed complementary measurements using the frequency of superconducting LC resonators as well as the resistance of normal-state meanders. Both methods yield comparable results, providing a well-characterized set of values of λ in aluminum in the relevant range for applications in fields such as quantum computing and microwave radiation detector technologies.

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