Reliable operation of Cr2O3:Mg/ β-Ga2O3 p-n heterojunction diodes at 600^

Abstract

β-Ga2O3-based semiconductor heterojunctions have recently demonstrated improved performance at high voltages and elevated temperatures and are thus promising for applications in power electronic devices and harsh-environment sensors. However, the long-term reliability of these ultra-wide band gap (UWBG) semiconductor devices remains barely addressed and may be strongly influenced by chemical reactions at the p-n heterojunction interface. Here, we experimentally demonstrate operation and evaluate the reliability of Cr2O3:Mg/ β-Ga2O3 p-n heterojunction diodes at during extended operation at 600, as well as after 30 repeated cycles between 25-550. The calculated pO2-temperature phase stability diagram of the Ga-Cr-O material system predicts that Ga2O3 and Cr2O3 should remain thermodynamically stable in contact with each other over a wide range of oxygen pressures and operating temperatures. The fabricated Cr2O3:Mg / β-Ga2O3 p-n heterojunction diodes show room-temperature on/off ratios >104 at 5V and a breakdown voltage (VBr) of -390V. The leakage current increases with increasing temperature up to 600, which is attributed to Poole-Frenkel emission with a trap barrier height of 0.19 eV. Over the course of a 140-hour thermal soak at 600, both the device turn-on voltage and on-state resistance increase from 1.08V and 5.34 m-cm2 to 1.59V and 7.1 m-cm2 respectively. This increase is attributed to the accumulation of Mg and MgO at the Cr2O3/Ga2O3 interface as observed from TOF-SIMS analysis. These findings inform future design strategies of UWBG semiconductor devices for harsh environment operation and underscore the need for further reliability assessments for β-Ga2O3 based devices.

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