Exploring Intrinsic and Extrinsic p-type Dopability of Atomically Thin β-TeO2 from First Principles
Abstract
Two-dimensional (2D) β-TeO2 has gained attention as a promising material for optoelectronic and power device applications, thanks to its transparency and high hole mobility. However, the underlying mechanism behind its p-type conductivity and dopability remains unclear. In this study, we investigate the intrinsic and extrinsic point defects in monolayer and bilayer β-TeO2, the latter of which has been experimentally synthesized, using the HSE+D3 hybrid functional. Our results reveal that most intrinsic defects are unlikely to contribute to p-type doping in 2D β-TeO2. Moreover, Si contamination could further impair p-type conductivity. Since the point defects do not contribute to p-type conductivity, we propose two possible mechanisms for hole conduction: hopping conduction via localized impurity states, and substrate effects. We also explored substitutional p-type doping in 2D β-TeO2 with 10 trivalent elements. Among these, the Bi dopant is found to exhibit a relatively shallow acceptor transition level. However, most dopants tend to introduce deep localized states, where hole polarons become trapped at Te's lone pairs. Interestingly, monolayer β-TeO2 shows potential advantages over bilayers due to reduced self-compensation effects for p-type dopants. These findings provide valuable insights into defect engineering strategies for future electronic applications involving 2D β-TeO2.
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