Focused ion beam polishing based optimization of high-Q silica microdisk resonators

Abstract

Whispering gallery mode (WGM) microdisk resonators are promising optical devices that confine light efficiently and enable enhanced nonlinear optical effects. This work presents a novel approach to reduce sidewall roughness in SiO\textsubscript{2} microdisk resonators using focused ion beam (FIB) polishing. The microdisks, with varying diameter ranging from 5 to 20 $\mu$m are fabricated using a multi-step fabrication scheme. However, the etching process introduces significant sidewall roughness, which increases with decreasing microdisk radius, degrading the resonators' quality. To address this issue, a FIB system is employed to polish the sidewalls, using optimized process parameters to minimize Ga ion implantation. White light interferometry measurements reveal a significant reduction in surface roughness from 7 nm to 20 nm for a 5 $\mu$m diameter microdisk, leading to a substantial enhancement in the scattering quality factor (Qss) from $3\times 10^2$ to $2\times 10^6$. These findings demonstrate the effectiveness of FIB polishing in improving the quality of microdisk resonators and open up new possibilities for the fabrication of advanced photonic devices.