Compact Ultra-low Loss Optical True Delay Line on Thin Film Lithium Niobate
Abstract
We report the fabrication of an 8-meter-long thin-film lithium niobate (TFLN) optical true delay line (OTDL) using the photolithography-assisted chemomechanical etching (PLACE) technique, showing a low transmission loss of 0.036 dB/cm in the conventional telecom band.
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