Solution-Based Fabrication of High-Performance K0.5Na0.5NbO3 Thin Films for Surface Haptics
Abstract
K0.5Na0.5NbO3 is among the most promising lead-free piezoelectrics. While its sputtered films match the performance of the champion piezoelectric Pb(Zr,Ti)O3, reproducible processing of high-quality and time-stable solution-processed K0.5Na0.5NbO3 films remains challenging. Here, we report 1 μm-thick Mn-doped K0.5Na0.5NbO3 films prepared through a chemical solution deposition process, which have perfectly dense microstructure and uniform composition across their thickness. The films exhibit a high transverse piezoelectric coefficient (e31,f = -15.4 C/m2), high dielectric permittivity (r ≈ 920), low dielectric losses (δ = 0.05) and can withstand electric fields up to at least 1 MV/cm. The functional properties show excellent stability over time, and the synthesis process is reproducible. Furthermore, a surface acoustic haptic device is demonstrated by using K0.5Na0.5NbO3 thin-film actuators. The results demonstrate the high potential of Mn-doped K0.5Na0.5NbO3 films to become a replacement for lead-based Pb(Zr,Ti)O3 films in piezoelectric applications.
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