A High-Resolution Transmission Line Model with De-embedding Structure for Ultralow Contact Resistivity Extraction
Abstract
In this article, we present a contact resistivity extraction method calibrated using a de-embedding structure, called High-Resolution Transmission Line Model (HR-TLM). HR-TLM has the similar infrastructure with Refined TLM (RTLM) or Refined-Ladder TLM(R-LTLM), but is optimized for calibration methods. Its advantage lies in maintaining low hoc extraction accuracy while significantly reducing the impact of structural process errors. According to the error analysis model, we verify that the extraction accuracy of HR-TLM based on R-LTLM can reach 10-9 cm2 at micron scale lithography precision.
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