The Role of Dwell Time on Advancing 3D Nano-printing of Complex Iron Nanostructure Geometries using Focused Electron Beam Induced Deposition

Abstract

The shift from two- to three-dimensional structures is not only a prominent trend in nanomagnetism but also reflects a broader movement across nanotechnology as a whole. Fields such as nanoelectronics, nanophotonics, data storage are poised to benefit from a new generation of greener, more versatile and multifunctional technologies enabled by this transition to 3D structures. While significant challenges remain, recent progress in bottom-up lithography, advanced microscopy, and computational techniques has made the future realization of these advancements increasingly feasible. Focused electron beam-induced deposition, is a cutting-edge direct-write nanofabrication technique used to manipulate matter at the nanoscale, combined with the unique magnetic properties of nanomaterials. It has gained significant attention in recent decades due to its potential applications in magnetic memories, such as racetrack memory. Consequently, substantial efforts have been directed toward developing nanofabrication techniques and characterizing magnetic nanoelements of various metal depositions. In our work, Fe-based nanostructures have been fabricated precisely using iron pentacarbonyl as a precursor. These structures include nanowires, 5-um bridges, rings, tetrapods, spirals and flower-like nanostructures. The deposition parameters, including electron beam dwell time, beam current, and precursor flux, have been further refined, have been further refined, enabling the precise fabrication of complex geometries.