High-throughput, Non-Destructive, Three-Dimensional Imaging of GaN Threading Dislocations with in-Plane Burgers Vector Component via Phase-Contrast Microscopy
Abstract
We demonstrate a nondestructive, high-throughput method for observing dislocations in GaN (0001) using phase-contrast microscopy (PCM). The PCM images (359x300 μm2) analyzed in this study were acquired with an exposure time of 3 ms per image. The one-to-one correspondence between threading dislocation (TD) contrasts in PCM images and the corresponding contrasts in multiphoton excitation photoluminescence (MPPL) images provides clear evidence that PCM can detect TDs with in-plane Burgers vector components. The contrast shape in PCM reflects the inclination of dislocations with respect to the surface normal: dot contrasts correspond to vertical dislocations, whereas line contrasts correspond to inclined dislocations. By shifting the focal plane from the top surface to the back surface, the three-dimensional propagation paths of dislocations can be visualized. The PCM image obtained represents a projection of threading dislocations within a thickness of approximately 43 μm. Dislocations spaced as close as 1.3 μm can be individually resolved. In addition, the capability of PCM to detect scratches, subsurface scratches, facet boundaries, and voids was demonstrated. This study establishes PCM as a versatile and laboratory-accessible technique for three-dimensional, nondestructive characterization of dislocations and other defects in wide-bandgap semiconductors.
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