Demonstration of KV-Class \b{eta}-Ga2O3 Trench Junction Barrier Schottky Diodes with SpaceModulated Junction Termination Extension

Abstract

In this work, we report on the design and fabrication of p-NiO/Ga2O3 trench junction barrier schottky diodes (JBSD) integrated with space-modulated junction termination extension (SM-JTE) and compare the performance with planar Ni/Ga2O3 schottky diodes (SBDs) and p-NiO/Ga2O3 heterojunction diodes (HJDs). The JBSDs achieved breakdown voltages exceeding 1.8 kV along with low leakage currents (<10-2 A/cm2), while displaying low turn on voltage (VON) of ~1V, which is similar to that of planar Ni/Ga2O3 SBDs. The fabricated devices showed excellent forward characteristics with low differential on-resistance (Ron,sp) ranging from 4-10.5 m{\Omega}-cm2, for fin width between 0.6- 1.25 microns. Best performing device with fin width of 0.85{\mu}m showed a unipolar figure of merit (FOM) of ~0.7GW/cm2. This work showcases the benefits of trench JBS design along with SM-JTE edge-termination for efficient high-performance kilovolt-class \b{eta}- Ga2O3 diodes.