Programmatically Generated Microparticles Using SUEX Dry-Film Epoxy Resist

Abstract

We present a lithographic method for fabricating free-standing microparticles directly from SUEX dry-film epoxy resist. Unlike conventional SU-8 particle fabrication, which requires patterning on solid substrates followed by sacrificial-layer release, our approach eliminates substrate use entirely and produces particles with near 100% yields. The process supports a wide design space of in-plane geometries, including high-aspect-ratio and highly complex shapes. To enable large-scale particle libraries, we integrate the method with the Nazca Python library, allowing programmatic generation of tens of thousands of parametrically defined particle designs. This combination of substrate-free fabrication and automated design provides a scalable route to custom microparticles for materials science, microfluidics, and soft-matter applications.