Localized Excitonic Emission in Wafer-Scale MOCVD-Grown GaSe 2D Nanosheets for Classical and Non-Classical Light Sources

Abstract

Wafer-scale growth of two-dimensional semiconductors remains a key challenge for their integration into photonic technologies. While most studies of two-dimensional semiconductors have focused on transition metal dichalcogenides and their scalable fabrication, comparatively little attention has been given to III-VI monochalcogenides. Here, we report wafer-scale growth of gallium selenide (GaSe) by metal-organic chemical vapor deposition (MOCVD) and investigate its structural and optical properties for visible-range classical and quantum light emission. Two samples with thicknesses ranging from a few monolayers to several micrometers, controlled via the growth time, were investigated. The 30-minute grown sample yields intense, broad photoluminescence spanning 1.7--2.0\,eV, whereas the thinner 3-minute sample exhibits discrete narrow emission lines and single-photon emission with (g(2)(0) = 0.15 0.10). Remarkably, cathodoluminescence mapping reveals pronounced spatial localization of both spectrally narrow and broad emission centers. Together with temperature-dependent power-law analysis and Raman mapping, our results indicate defect-induced emission rather than intrinsic excitonic recombination. These findings establish wafer-scale MOCVD grown 2D GaSe as a platform for classical and non-classical light sources and highlight defect-engineered localization as a route toward scalable quantum photonics.

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