Synthesis and Characterization of Atomically-Sharp Superconductor-Dielectric Interface

Abstract

Modification of superconductor-dielectric interfaces is known to strongly impact coherence times of superconducting quantum devices. This relationship is thought to arise from differences in the concentration of "two-level system" defects in the disordered dielectrics and superconductor-dielectric interfaces; these defects couple to electromagnetic modes in the device and cause dissipation. Zirconium oxide barrier layers on niobium have emerged as a promising pathway to low-loss interfaces in recent years, evidently due to the crystalline nature of these layers in comparison to the amorphous niobium native oxide. We explain the unique ability of zirconium oxide to form a crystalline layer, to maintain a sharp interface with metallic niobium, and to prevent niobium oxide re-growth in terms of the chemical properties of ZrO$_2$ and the Nb-Zr-O ternary system. We demonstrate a new method to grow air-stable zirconium oxide layers on niobium with a higher level of crystallinity and a sharper oxide-metal interface than previously shown, and provide the first comprehensive microscopic analysis of ZrO$_2$ capping layer properties. These developments pave the way toward vital performance advances in superconducting quantum devices.