Chemical Vapor Deposition of Ni-doped Iron Germanium Telluride Nanosheets

Abstract

Iron germanium telluride (FGT; FemGenTe2) compounds have attracted significant interest due to their layered van der Waals structure, relatively high Curie temperature, and tunable magnetic properties. Chemical vapor deposition (CVD) is a particularly promising synthesis route owing to its simplicity, low cost, potential for scalability, and widespread adoption in the semiconductor industry, yet it has not been used previously to synthesize FGT with dopants. Here, we report CVD synthesis of both undoped and Ni-doped FGT nanosheets on SiO2/Si substrates. By adjusting precursor molar ratios, we synthesized Ni-doped FGT with multiple Fe concentrations and a 4% Ni-to-Fe ratio. X-ray photoelectron spectroscopy depth profiling further demonstrates that Ni is present in the bulk of the crystals. This straightforward, low-cost, and CMOS-compatible approach demonstrates a route to Ni-doped FGT nanosheets, establishing a foundation for future characterization of Ni-doped FGT and its potential integration into spintronic devices.