Fluctuations of self-flattening surfaces
Yup Kim, S. Y. Yoon, Hyunggyu Park
Abstract
We study the scaling properties of self-flattening surfaces under global suppression on surface fluctuations. Evolution of self-flattening surfaces is described by restricted solid-on-solid type monomer deposition-evaporation model with reduced deposition (evaporation) at the globally highest (lowest) site. We find numerically that equilibrium surface fluctuations are anomalous with roughness exponent α 1/3 and dynamic exponent zW 3/2 in one dimension (1D) and α=0 () and zW 5/2 in 2D. Stationary roughness can be understood analytically by relating our model to the static self-attracting random walk model and the dissociative dimer type deposition-evaporation model. In case of nonequilibrium growing/eroding surfaces, self-flattening dynamics turns out to be irrelevant and the normal Kardar-Parisi-Zhang universality is recovered in all dimensions.
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