Height Fluctuations and Intermittency of V2 O5 Films by Atomic Force Microscopy
Abstract
The spatial scaling law and intermittency of the V2 O5 surface roughness by atomic force microscopy has been investigated. The intermittency of the height fluctuations has been checked by two different methods, first, by measuring scaling exponent of q-th moment of height-difference fluctuations i.e. Cq = < |h(x1) - h(x2)|q > and the second, by defining generating function Z(q,N) and generalized multi-fractal dimension Dq. These methods predict that there is no intermittency in the height fluctuations. The observed roughness and dynamical exponents can be explained by the numerical simulation on the basis of forced Kuramoto-Sivashinsky equation.
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