The structure and stability of beta-Ta thin films

Abstract

Ta films with tetragonal crystalline structure (beta-phase), deposited by magnetron sputtering on different substrates (steel, silicon and silicon dioxide), have been studied. In all cases, very highly preferred (001) orientation was observed in x-ray diffraction (XRD) measurements. All diffraction data revealed two weak reflections corresponding to d-spacing of 0.5272 and 0.1777 nm. The presence of the two peaks, attributed to (001) and (003) reflections, indicates that beta-Ta films exhibit a high preference for the space group of P-421m over P42/mnm, previously proposed for beta-Ta. Differences in relative intensities of (00l) reflections, calculated for single crystal beta-Ta sigma-type Frank-Kasper structure and those measured in the films, are attributed to defects in the films. Molecular dynamics simulations performed on tantalum clusters with six different initial configurations using the embedded-atom-method (EAM) potential revealed the stability of beta-Ta, which might explain its growth on many substrates under various deposition conditions.