Influence of the gate leakage current on the stability of organic single-crystal field-effect transistors
R. W. I. de Boer, N. N. Iosad, A. F. Stassen, T. M. Klapwijk, A. F. Morpurgo
Abstract
We investigate the effect of a small leakage current through the gate insulator on the stability of organic single-crystal field-effect transistors (FETs). We find that, irrespective of the specific organic molecule and dielectric used, leakage current flowing through the gate insulator results in an irreversible degradation of the single-crystal FET performance. This degradation occurs even when the leakage current is several orders of magnitude smaller than the source-drain current. The experimental data indicate that a stable operation requires the leakage current to be smaller than 10-9 \ A/cm2. Our results also suggest that gate leakage currents may determine the lifetime of thin-film transistors used in applications.
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