Understanding self-assembled nanosphere patterns
Abstract
Patterns generated by a colloidal suspension of nanospheres drying on a frictional substrate are studied by experiments and computer simulations. The obtained two-dimensional self-assembled structures are commonly used for nanosphere lithography. A spring-block stick-slip model is introduced for simulating the phenomenon and the influence of several controllable parameters on the final structure is investigated. The model successfully reproduces the experimentally observed patterns and the dynamics leading to pattern formation is revealed.
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