Measurement of Local Reactive and Resistive Photoresponse of a Superconducting Microwave Device
Alexander P. Zhuravel, Steven M. Anlage, Alexey V. Ustinov
Abstract
We propose and demonstrate a spatial partition method for the high-frequency photo-response of superconducting devices correlated with inductive and resistive changes in microwave impedance. Using a laser scanning microscope, we show that resistive losses are mainly produced by local defects at microstrip edges and by intergrain weak links in the high-temperature superconducting material. These defects initiate nonlinear high-frequency response due to overcritical current densities and entry of vortices.
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