Effect of shallow traps on polaron transport at the surface of organic semiconductors
M. F. Calhoun, C. Hsieh, V. Podzorov
Abstract
The photo-induced electron and hole transfer across the semiconductor-dielectric interface in trap dominated p-type organic field-effect transistors (OFETs) has been investigated. It has been observed that the transfer of electrons into the dielectric results in a decrease of the field-effect mobility of polarons, suggesting that additional shallow traps are generated in the conduction channel. Using this effect, the dependence of the field-effect mobility on the density of shallow traps, mu(N), has been measured, which allowed to estimate the average polaron trapping time, tautr = 50 +- 10 ps, and the density of shallow traps, N0 = (3 +- 0.5)*1011 cm-2, in the channel of single-crystal tetracene devices.
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