(In,Ga)As gated-vertical quantum dot with an Al2O3 insulator
Abstract
We fabricated a gated-vertical (In,Ga)As quantum dot with an Al2O3 gate insulator deposited using atomic layer deposition and investigated its electrical transport properties at low temperatures. The gate voltage dependence of the dI/dV-V characteristics shows clear Coulomb diamonds at 1.1K. The metal-insulator gate structure allowed us to control the number of electrons in the quantum dot from 0 to a large number estimated to be about 130.
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