High performance hard magnetic NdFeB thick films for integration into Micro-Electro-Mechanical-Systems
N. M. Dempsey, Arnaud Walther, Frederic May, Dominique Givord, Kirill Khlopkov, Oliver Gutfleisch
Abstract
5μm thick NdFeB films have been sputtered onto 100 mm Si substrates using high rate sputtering (18 μm/h). Films were deposited at ≤ 500 C and then annealed at 750 C for 10 minutes. While films deposited at temperatures up to 450 C have equiaxed grains, the size of which decreases with increasing deposition temperature, the films deposited at 500 C have columnar grains. The out-of-plane remanent magnetization increases with deposition temperature, reaching a maximum value of 1.4 T, while the coercivity remains constant at about 1.6 T. The maximum energy product achieved (400 kJ/m3) is comparable to that of high-quality NdFeB sintered magnets.
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