Quantitative Imaging of Sheet Resistance with a Scanning Near-Field Microwave Microscope
D. E. Steinhauer, C. P. Vlahacos, S. K. Dutta, B. J. Feenstra, F. C. Wellstood, Steven M. Anlage
Abstract
We describe quantitative imaging of the sheet resistance of metallic thin films by monitoring frequency shift and quality factor in a resonant scanning near-field microwave microscope. This technique allows fast acquisition of images at approximately 10 ms per pixel over a frequency range from 0.1 to 50 GHz. In its current configuration, the system can resolve changes in sheet resistance as small as 0.6 Ohms/sq for 100 Ohms/sq films. We demonstrate its use at 7.5 GHz by generating a quantitative sheet resistance image of a YBa2Cu3O7 (YBCO) thin film on a 5 cm-diameter sapphire wafer.
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