Entangled-State Lithography: Tailoring any Pattern with a Single State
Abstract
We demonstrate a systematic approach to Heisenberg-limited lithographic image formation using four-mode reciprocal binominal states. By controlling the exposure pattern with a simple bank of birefringent plates, any pixel pattern on a (N+1) × (N+1) grid, occupying a square with the side half a wavelength long, can be generated from a 2 N-photon state.
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