Quantum Lithography in Macroscopic Observations
De-Zhong Cao, Kaige Wang
Abstract
We study the generalized Young's double-slit interference for the beam produced in the spontaneously parametric down-conversion (SPDC). We find that the sub-wavelength lithography can occur macroscopically in both the two-photon intensity measurement and the single-photon spatial intensity correlation measurement. We show the visibility and the strength of the interference fringe related to the SPDC interaction. It may provide a strong quantum lithography with a moderate visibility in practical application.
Create a lesson
Related papers
Parallel quantum channel discrimination and numerical ranges in tensor product subspaces
Adam Bílek, Paulina Lewandowska, Ryszard Kukulski
Asymptotically Good Quantum Locally Testable Codes
William Gay, Fernando Granha Jeronimo
All causally separable quantum processes are quantum circuits with classical control of causal order
Julian Wechs, Alastair A. Abbott, Cyril Branciard
Analytic leakage suppression with a single control field: fast two-qubit gates with tunable couplers
Lukas Heunisch, Michael J. Hartmann, Aashish A. Clerk
Procrastinating einselection in non-Markovian quantum dynamics
Michael J. Moody, Tara Kalsi, Agung Budiyono et al.
Quantum Entropy Contraction and Factorization from Hypercontractivity
Li Gao, Lijun Wang