Two-dimensional Nanolithography Using Atom Interferometry
A. Gangat, P. Pradhan, G. Pati, M. S. Shahriar
Abstract
We propose a novel scheme for the lithography of arbitrary, two-dimensional nanostructures via matter-wave interference. The required quantum control is provided by a pi/2-pi-pi/2 atom interferometer with an integrated atom lens system. The lens system is developed such that it allows simultaneous control over atomic wave-packet spatial extent, trajectory, and phase signature. We demonstrate arbitrary pattern formations with two-dimensional 87Rb wavepackets through numerical simulations of the scheme in a practical parameter space. Prospects for experimental realizations of the lithography scheme are also discussed.
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