Critical State Flux Penetration and Linear Microwave Vortex Response in YBa2Cu3O7-x Films
Balam A. Willemsen, J. S. Derov, S. Sridhar
Abstract
The vortex contribution to the dc field (H) dependent microwave surface impedance Zs = Rs+iXs of YBa2Cu3O7-x thin films was measured using suspended patterned resonators. Zs(H) is shown to be a direct measure of the flux density B(H) enabling a very precise test of models of flux penetration. Three regimes of field-dependent behavior were observed: (1) Initial flux penetration occurs on very low field scales Hi(4.2K) 100Oe, (2) At moderate fields the flux penetration into the virgin state is in excellent agreement with calculations based upon the field-induced Bean critical state for thin film geometry, parametrized by a field scale Hs(4.2K) Jc*d 0.5T, (3) for very high fields H >>Hs, the flux density is uniform and the measurements enable direct determination of vortex parameters such as pinning force constants αp and vortex viscosity η. However hysteresis loops are in disagreement with the thin film Bean model, and instead are governed by the low field scale Hi, rather than by Hs. Geometric barriers are insufficient to account for the observed results.
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